

                The  unprocessed Epitaxial Wafers of class 30% contain our high-efficiency GaInP/GaAs/Ge based epitaxial layers on a Ge substrate. These epixial wafers can be used for any further processing and customized cell designs.

Design and Mechanical Data
  Substrate Material :GaInP/GaInAs/Ge on Ge substrate Base Material :100 mm ±0.20
 Thickness :145 μm ±15 μm or 175 μm ±15 μm
 Major Flat length :32.5 mm ±2 mm
 Major Flat orientation:(100) ±2°	
  
 Average Weight :≤ 93 mg/cm2
 Laser mark label:Alpha-numeric	 


